Heterojunction manufacturing generally requires the use of
molecular beam epitaxy (MBE) or
chemical vapor deposition (CVD) technologies in order to precisely control the deposition thickness and create a cleanly lattice-matched abrupt interface. A recent alternative under research is the mechanical stacking of layered materials into
van der Waals heterostructures. Despite their expense, heterojunctions have found use in a variety of specialized applications where their unique characteristics are critical: •
Solar cells: Heterojunctions are formed through the interface of a
crystalline silicon substrate (band gap 1.1 eV) and
amorphous silicon thin film (band gap 1.7 eV) in some solar cell architectures. The heterojunction is used to separate charge carriers in a similar way to a
p–n junction. The
Heterojunction with Intrinsic Thin-Layer (HIT) solar cell structure was first developed in 1983 and commercialised by
Sanyo/
Panasonic. HIT solar cells now hold the record for the most efficient single-junction silicon solar cell, with a conversion efficiency of 26.7%. •
Lasers: Using heterojunctions in
lasers was first proposed in 1963 when
Herbert Kroemer, a prominent scientist in this field, suggested that
population inversion could be greatly enhanced by heterostructures. By incorporating a smaller
direct band gap material like
GaAs between two larger band gap layers like
AlAs,
carriers can be confined so that
lasing can occur at
room temperature with low threshold currents. It took many years for the
material science of heterostructure fabrication to catch up with Kroemer's ideas but now it is the industry standard. It was later discovered that the band gap could be controlled by taking advantage of the
quantum size effects in
quantum well heterostructures. Furthermore, heterostructures can be used as
waveguides to the
index step which occurs at the interface, another major advantage to their use in semiconductor lasers. Semiconductor
diode lasers used in
CD and
DVD players and
fiber optic transceivers are manufactured using alternating layers of various
III-V and
II-VI compound semiconductors to form lasing heterostructures. •
Bipolar transistors: When a heterojunction is used as the base-emitter junction of a
bipolar junction transistor, extremely high forward
gain and low reverse gain result. This translates into very good high frequency operation (values in tens to hundreds of GHz) and low
leakage currents. This device is called a
heterojunction bipolar transistor (HBT). •
Field effect transistors: Heterojunctions are used in
high electron mobility transistors (HEMT) which can operate at significantly higher frequencies (over 500 GHz). The proper
doping profile and band alignment gives rise to extremely high
electron mobilities by creating a
two dimensional electron gas within a
dopant free region where very little
scattering can occur. •
Catalysis: Using heterojuntions as photocatalyst has demonstrated that they exhibit better performance in CO2 photoreduction, H2 production and photodegradation of pollutants in water than single metal oxides. The performance of the heterojunction can be further improved by incorporation of oxygen vacancies, crystal facet engineering or incorporation of carbonaceous materials. == Energy band alignment ==