An effort is currently being made to integrate plasmonics with
electric circuits, or in an electric circuit analog, to combine the size efficiency of electronics with the data capacity of
photonic integrated circuits (PIC). While gate lengths of
CMOS nodes used for electrical circuits are ever decreasing, the size of conventional PICs is limited by
diffraction, thus constituting a barrier for further integration. Plasmonics could bridge this size mismatch between electronic and photonic components. At the same time, photonics and plasmonics can complement each other, since, under the right conditions, optical signals can be converted to SPPs and vice versa. One of the biggest issues in making plasmonic circuits a feasible reality is the short propagation length of surface plasmons. Typically, surface plasmons travel distances only on the scale of millimeters before damping diminishes the signal. This is largely due to ohmic losses, which become increasingly important the deeper the electric field penetrates into the metal. Researchers are attempting to reduce losses in surface plasmon propagation by examining a variety of materials, geometries, the frequency and their respective properties. New promising low-loss plasmonic materials include metal oxides and nitrides as well as
graphene. Key to more design freedom are improved fabrication techniques that can further contribute to reduced losses by reduced surface roughness. Another foreseeable barrier plasmonic circuits will have to overcome is heat; heat in a plasmonic circuit may or may not exceed the heat generated by complex electronic circuits. In addition to heat, it is also difficult to change the direction of a plasmonic signal in a circuit without significantly reducing its amplitude and propagation length. Finally, emerging applications of plasmonics for thermal emission manipulation and heat-assisted magnetic recording leverage Ohmic losses in metals to obtain devices with new enhanced functionalities. ==Waveguiding==