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Resist

A resist, used in many areas of manufacturing and art, is something that is added to parts of an object to create a pattern by protecting these parts from being affected by a subsequent stage in the process. Often the resist is then removed.

Etching
Etching processes use a resist, though in these typically the whole object is covered in the resist (called the "ground" in some contexts), which is then selectively removed from some parts. This is the case when a resist is used to prepare the copper substrate for champlevé enamels, where parts of the field are etched (with acid or electrically) into hollows to be filled with powdered glass, which is then melted. In chemical milling, as many forms of industrial etching are called, the resist may be referred to as the "maskant", and in many contexts the process may be known as masking. A fixed resist pre-shaped with the pattern is often called a stencil, or in some contexts a frisket. The Oxford English Dictionary does not record the word "resist" in this sense before the 1830s, when it was used in relation to both "calico-printing" (1836) and metalwork with copper (1839). Resists were also used to etch steel from the mid-19th century. ==Gallery==
Gallery
File:Kosode (Running waters and wheels with mallets).Detail. Matsuzakaya Collection.jpg| resist technique, with crisp, thin white outlines around the dyed patterns, created by ridges of resist paste that separate areas of dye File:Buddhist Priest's Mantle (Kesa) LACMA M.2006.46 (16 of 18).jpg|Detail of tie-dyed silk (kanako shibori) with embroidery, Japan, 17th century. Pressure resist, no paste. File:Batik-encerat2.jpg|Applying a batik resist in Sri Lanka File:Tea Bowl (Chawan) with Leaf LACMA 58.49.5 (2 of 2).jpg|Jizhou ware tea bowl with natural leaf resist decoration and brown glaze, late southern Song dynasty, about 1200–1279 File:Al photoresist pattern developed via Nomarski DIC.jpg|A problem in a silicon integrated circuit wafer. The pink and blue irregularly shaped rectangles are areas of photoresist that should have been fully developed and rinse away (purple), but there was a defect in processing. Seen under differential interference contrast microscopy. ==References==
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