Non-radiative recombination is a process in
phosphors and
semiconductors, whereby
charge carriers recombine releasing
phonons instead of photons. Non-radiative recombination in optoelectronics and phosphors is an unwanted process, lowering the light generation efficiency and increasing heat losses. Non-radiative life time is the average time before an
electron in the
conduction band of a
semiconductor recombines with a
hole. It is an important parameter in
optoelectronics where
radiative recombination is required to produce a photon; if the non-radiative life time is shorter than the radiative, a carrier is more likely to recombine non-radiatively. This results in low internal
quantum efficiency.
Shockley–Read–Hall (SRH) In
Shockley-Read-Hall recombination (
SRH), also called
trap-assisted recombination, the electron in transition between
bands passes through a new
energy state (localized state) created within the
band gap by a
dopant or a
defect in the
crystal lattice; such energy states are called
traps. Non-radiative recombination occurs primarily at such sites. The energy is exchanged in the form of lattice vibration, a phonon exchanging thermal energy with the material. Since traps can absorb differences in
momentum between the carriers, SRH is the dominant recombination process in
silicon and other
indirect bandgap materials. However, trap-assisted recombination can also dominate in
direct bandgap materials under conditions of very low
carrier densities (very low level injection) or in materials with high density of traps such as
perovskites. The process is named after
William Shockley,
William Thornton Read and
Robert N. Hall, who published it in 1952.
Types of traps Electron traps vs. hole traps Even though all the recombination events can be described in terms of electron movements, it is common to visualize the different processes in terms of excited electron and the electron
holes they leave behind. In this context, if trap levels are close to the
conduction band, they can temporarily immobilize excited electrons or in other words, they are
electron traps. On the other hand, if their energy lies close to the
valence band they become
hole traps. Shallow traps vs. deep traps The distinction between shallow and deep traps is commonly made depending on how close electron traps are to the conduction band and how close hole traps are to the valence band. If the difference between trap and band is smaller than the
thermal energy kBT it is often said that it is a
shallow trap. Alternatively, if the difference is larger than the thermal energy, it is called a
deep trap. This difference is useful because shallow traps can be emptied more easily and thus are often not as detrimental to the performance of optoelectronic devices.
SRH model In the SRH model, four things can happen involving trap levels: • An electron in the conduction band can be trapped in an intragap state. • An electron can be emitted into the conduction band from a trap level. • A hole in the valence band can be captured by a trap. This is analogous to a filled trap releasing an electron into the valence band. • A captured hole can be released into the valence band. Analogous to the capture of an electron from the valence band. When carrier recombination occurs through traps, we can replace the valence
density of states by that of the intragap state. The term p(n) is replaced by the density of trapped electrons/holes N_t(1-f_t). R_{nt}=B_n n N_t (1-f_t) Where N_t is the density of trap states and f_t is the probability of that occupied state. Considering a material containing both types of traps, we can define two trapping coefficients B_n, B_p and two de-trapping coefficients G_n, G_p. In equilibrium, both trapping and de-trapping should be balanced {{nowrap|(R_{nt}=G_{n}}} and R_{pt}=G_{p}). Then, the four rates as a function of f_t become: \begin{array}{l l} R_{nt}=B_nnN_{t}(1-f_t)& G_n=B_n n_t N_t f_t \\ R_{pt}=B_p p N_t f_t&G_p=B_p p_t N_t (1-f_t) \end{array} Where n_t and p_t are the electron and hole densities when the
quasi Fermi level matches the trap energy. In steady-state condition, the net recombination rate of electrons should match the net recombination rate for holes, in other words: R_{nt}-G_n =R_{pt}-G_p. This eliminates the occupation probability f_t and leads to the Shockley-Read-Hall expression for the trap-assisted recombination: R=\frac {np}{\tau_n(p+p_t)+\tau_p(n+n_t)} Where the average lifetime for electrons and holes are defined as: R_{A0} = G_0 = C_n n_0^2 p_0 + C_p n_0 p_0^2 where C_n,C_p are the Auger capture probabilities. The non-equilibrium Auger recombination rate r_A and resulting net recombination rate U_A under steady-state conditions are \tau_A = \frac{\Delta n}{R_A} = \frac{1}{ n^2C_n + 2n_i^2(C_n+C_p) +p^2C_p } \,. The mechanism causing
LED efficiency droop was identified in 2007 as Auger recombination, which met with a mixed reaction. In 2013, an experimental study claimed to have identified Auger recombination as the cause of efficiency droop. However, it remains disputed whether the amount of Auger loss found in this study is sufficient to explain the droop. Other frequently quoted evidence against Auger as the main droop-causing mechanism is the low-temperature dependence of this mechanism, which is the opposite of that found for the droop. The Auger mechanism is invoked for
quantum dots.
Surface recombination Trap-assisted recombination at the surface of a semiconductor is referred to as surface recombination. This occurs when traps at or near the surface or interface of the semiconductor form due to dangling bonds caused by the sudden discontinuation of the semiconductor crystal. Surface recombination is characterized by surface recombination velocity which depends on the density of surface defects. In applications such as solar cells, surface recombination may be the dominant mechanism of recombination due to the collection and extraction of free carriers at the surface. In some applications of solar cells, a layer of transparent material with a large band gap, also known as a window layer, is used to minimize surface recombination.
Passivation techniques are also employed to minimize surface recombination.
Langevin recombination For free carriers in low-mobility systems, the recombination rate is often described with the
Langevin recombination rate. The model is often used for disordered systems such as organic materials (and is hence relevant for
organic solar cells) and other such systems. The
Langevin recombination strength is defined as \gamma = \tfrac{q}{\varepsilon}\mu. ==See also==