Diazonaphthoquinone (DNQ)-
novolac photoresist is one material used as the carrier for making color filters from color dyes or pigments. There is some interference between the dyes and the
ultraviolet light needed to properly expose the polymer, though solutions have been found for this problem. discuss other specific chemical substances, attending optical properties, and optimal manufacturing processes of color filter arrays. For instance, Nakamura said that materials for on-chip color filter arrays fall into two categories:
pigment and
dye. Pigment based CFAs have become the dominant option because they offer higher heat resistance and light resistance compared to dye based CFAs. In either case, thicknesses ranging up to 1 micrometre are readily available. while other sensors have the CFA manufactured directly on the surface of the imager. Theuwissen makes no mention of the materials utilized in CFA manufacture. At least one early example of an on-chip design utilized gelatin filters (Aoki et al., 1982). The gelatin is sectionalized, via
photolithography, and subsequently dyed. Aoki reveals that a CYWG arrangement was used, with the G filter being an overlap of the Y and C filters. Filter materials are manufacturer specific. Adams et al. state "Several factors influence the CFA's design. First, the individual CFA filters are usually layers of transmissive (absorptive) organic or pigment dyes. Ensuring that the dyes have the right mechanical properties—such as ease of application, durability, and resistance to humidity and other atmospheric stresses—is a challenging task. This makes it difficult, at best, to fine-tune the spectral responsivities.". Given that the CFAs are deposited on the image sensor surface at the
BEOL (back end of line, the later stages of the
integrated circuit manufacturing line), where a low-temperature regime must be rigidly observed (due to the low melting temperature of the aluminum metalized "wires" and the substrate mobility of the dopants implanted within the bulk silicon), organics would be preferred over glass. On the other hand, some CVD silicon oxide processes are low temperature processes. Ocean Optics has indicated that their patented
dichroic filter CFA process (alternating
thin films of
ZnS and
Cryolite) can be applied to spectroscopic CCDs. Gersteltec sells
photoresists that possesses color filter properties.
Some pigment and dye molecules used in CFAs In US Patent # 4,808,501, Carl Chiulli cites the use of 5 chemicals, three of which are C.I. #12715, AKA Solvent Red 8; Solvent Yellow 88; and C.I. # 61551, Solvent Blue 36. In US Patent # 5,096,801, Koya
et al., of Fuji Photo Film company, list some 150-200 chemical structures, mainly azo dyes and pyrazolone-diazenyl, but did not provide specific chemical names, CAS Registry numbers, or Colour Index numbers.
Optically efficient CFA implementation Nakamura Further, a short discussion of anti-reflection films is offered, though Janesick's work appears is more concerned with photon–silicon interaction. Early work on
microlenses and on the
three-CCD/prism cameras stress the importance of a fully integrated design solution for CFAs. The
camera system, as a whole, benefits from careful consideration of CFA technologies and their interplay with other sensor properties. == E-paper CFA ==