In
semiconductor devices, leakage is a
quantum phenomenon where mobile charge carriers (electrons or
holes)
tunnel through an insulating region. Leakage increases exponentially as the thickness of the insulating region decreases. Tunneling leakage can also occur across
semiconductor junctions between heavily
doped P-type and
N-type semiconductors. Other than tunneling via the
gate insulator or junctions, carriers can also leak between source and drain terminals of a
Metal Oxide Semiconductor (MOS) transistor. This is called
subthreshold conduction. The primary source of leakage occurs inside
transistors, but electrons can also leak between interconnects. Leakage increases power consumption and if sufficiently large can cause complete circuit failure. Leakage is currently one of the main factors limiting increased computer processor performance. Efforts to minimize leakage include the use of
strained silicon,
high-κ dielectrics, and/or stronger
dopant levels in the semiconductor. Leakage reduction to continue
Moore's law will not only require new material solutions but also proper system design. Certain types of semiconductor manufacturing defects exhibit themselves as increased leakage. Thus measuring leakage, or
Iddq testing, is a quick, inexpensive method for finding defective chips. Increased leakage is a common
failure mode resulting from non-catastrophic overstress of a semiconductor device, when the junction or the gate oxide suffers permanent damage not sufficient to cause a
catastrophic failure. Overstressing the gate oxide can lead to
stress-induced leakage current. In
bipolar junction transistors, the emitter current is the sum of the collector and base currents. Ie = Ic + Ib. The collector current has two components: minority carriers and majority carriers. The minority current is called the leakage current. In heterostructure field-effect transistors (HFETs) the gate leakage is usually attributed to the high density of traps residing within the barrier. The gate leakage of GaN HFETs has been so far observed to remain at higher levels compared with the other counterparts such as GaAs. Leakage current is generally measured in microamperes. For a reverse-biased diode it is temperature sensitive. Leakage current must be carefully examined for applications that work in wide temperature ranges to know the diode characteristics. ==See also==