Ultrapure water

A number of organizations and groups develop and publish standards associated with the production of UPW. For microelectronics and power, they include Semiconductor Equipment and Materials International (SEMI) (microelectronics and photovoltaic), American Society for Testing and Materials International (ASTM International) (semiconductor, power), Electric Power Research Institute (EPRI) (power), American Society of Mechanical Engineers (ASME) (power), and International Association for the Properties of Water and Steam (IAPWS) (power). Pharmaceutical plants follow water quality standards as developed by pharmacopeias, of which three examples are the United States Pharmacopeia, European Pharmacopeia, and Japanese Pharmacopeia. ==Purification process==

Water is typically sourced from city feed water or other local supplies and is taken through a series of purification steps that results in UPW. Some systems recycle used UPW water back into their UPW filtration system as this water is often cleaner than original sources. The purification steps have been broadly categorized into pretreatment, primary treatment, polishing, and/or distribution. As a membrane-filtration method it also removes suspended solids as well. ==Contamination sources and removal==

Bacteria, particles, organic carbon, ions, and dissolved gases are all present in typical municipal water systems and must be removed to create ultrapure water. Particles and bacteria Particles in UPW can cause defects in semiconductors, especially in photolithographic processes that define nanometer-sized features. Particulates can interfere with etching processes and bridge nanometer-scale features in final circuits causing electrical failures. Particles can be controlled by filtration for larger particles and ultrafiltration for nanometer scale particles. Particle sources can include bacterial fragments or particles from the walls of the fluid handling system. Bacteria have been referred to as one of the most obstinate on this list to control as certain bacteria can still grow, even in low-nutrient environments. Bacteria can be controlled by sanitization or ultrafiltration (found in some pharmaceutical, but mostly semiconductor industries). Chemical sanitization can be performed using ozone or hydrogen peroxide. Anions and cations Cations including sodium, potassium, calcium, and magnesium are common in industrial water supplies. Common anions include chloride, sulfate, and bicarbonate. Several methods are used to remove ions from input water supplies including reverse osmosis, distillation, and/or ion exchange. Distillation can be used to remove non-volatile metal cations and was historically used for water purification. However, distillation is energy-intensive compared to the combination of reverse osmosis and ion exchange which are more common in modern systems. Organic carbon The removal of organic carbon from water is one of the differentiators between deionized water and ultrapure water. Sources include bacteria, leaching from plastic piping, and dissolved atmospheric sources. Organic carbon can be removed using filtration by activated carbon and oxidation of organic carbon to carbon dioxide/bicarbonate. Dissolved gases Oxygen dissolved in water can lead to unwanted oxidation of silicon wafers and other materials while gases like carbon dioxide lead to unwanted acidification of water and must be removed. Gases can be removed through various methods including thermal or pressure degassing, membrane degassers or chemical degassing. Silica Silica naturally leaches from glass walls and enters water supplies. Dissolved silica, in the form of the silicate anion, can be removed through reverse osmosis or anion exchange. Solid, colloidal silica can be removed via ultrafiltration with or without coagulation to increase particle size. ==Applications==

The primary industries using UPW are: • semiconductor devices fabrication process • solar photovoltaics • pharmaceuticals • power generation (sub and super critical boilers) • specialty applications such as research laboratories. The standards are based on the application. For instance, semiconductor plants use UPW as a cleaning agent, so it is important that the water not contain dissolved contaminants that can precipitate or particles that may lodge on circuits and cause microchip failures. The power industry uses UPW to make steam to drive steam turbines; pharmaceutical facilities use UPW as a cleaning agent, as well as an ingredient in products, so they seek water free of endotoxins, microbials, and viruses. Applications in semiconductor industry UPW is used extensively in the semiconductor industry where the highest grade of purity is required. The use of UPW varies; it may be used to rinse the wafer after application of chemicals, to dilute the chemicals themselves, in optics systems for immersion photolithography, or as make-up to cooling fluid in some critical applications. UPW is even sometimes used as a humidification source for the cleanroom environment. The primary, and most critical, application of UPW is in wafer cleaning in and after wet etching step during the FEOL stage. Impurities which can cause product contamination or impact process efficiency (e.g. etch rate) must be removed from the water during cleaning and etching stage. In chemical-mechanical polishing processes, water is used in addition to reagents and abrasive particles. As of 2002 1-2 parts of contaminating molecules per one million of water ones was considered to be an "ultrapure water" (e.g. semiconductor grade). Applications in pharmaceutical industry A typical use of ultrapure water in pharmaceutical and biotechnology industries is summarized in the table below: Uses of ultrapure water in the pharmaceutical and biotechnology industries In order to be used for pharmaceutical and biotechnology applications for production of licensed human and veterinary health care products it must comply with the specification of the following pharmacopeias monographs: • British Pharmacopoeia (BP): Purified water • Japanese Pharmacopoeia (JP): Purified water • European Pharmacopoeia (Ph Eur): Aqua purificata • The United States Pharmacopoeia (USP): Purified water Note: Purified Water is typically a main monograph which references other applications that use Ultrapure water Ultrapure water is often used as a critical utility for cleaning applications (as required). It is also used to generate clean steam for sterilization. The following table summarizes the specifications of two major pharmacopoeias for 'water for injection': Pharmacopoeia specifications for water for injection ==Analytical methods for ultrapure water==

On-line analytical measurements Conductivity/resistivity In ultra-pure water systems, electrolytic conductivity or resistivity, which are reciprocals of each other, is used as a general indicator of water purity. Absolutely pure water has a conductivity of 0.05501 μS/cm and a resistivity of 18.18 MΩ⋅cm at 25 °C, and ultra-pure water is typically specified to approach or meet this target. Ultrapure water is easily contaminated by traces of carbon dioxide from the atmosphere passing through tiny leaks or diffusing through thin wall polymer tubing when sample lines are used for measurement. Carbon dioxide forms conductive carbonic acid in water which dissociates into H+ and bicarbonate. For this reason, conductivity probes are often used to provide continuous monitoring of conductivity/resistivity to ensure purity. Sodium Sodium is usually the first ion to break through a depleted cation exchanger. Sodium measurement can quickly detect this condition and is widely used as the indicator for cation exchange regeneration. The conductivity of cation exchange effluent is always quite high due to the presence of anions and hydrogen ion and therefore conductivity measurement is not useful for this purpose. On-line sodium measurement in ultrapure water most commonly uses a glass membrane sodium ion-selective electrode and a reference electrode in an analyzer measuring a small continuously flowing side-stream sample. Dissolved oxygen Advanced microelectronics manufacturing processes require dissolved oxygen (DO) concentrations to be HO + hν (185 nm) → OH• + H • and H • + H • → H Different types of UPW TOC Analyzers IC (Inorganic Carbon) = + + TC (Total Carbon) = Organic Carbon + IC TOC (Total Organic Carbon) = TC – IC HO + hν (185 nm) → OH• + H • + hν (254 nm) → 2 • • + → + OH • Offline lab analysis When testing the quality of UPW, consideration is given to where that quality is required and where it is to be measured. The point of distribution or delivery (POD) is the point in the system immediately after the last treatment step and before the distribution loop. It is the standard location for the majority of analytical tests. The point of connection (POC) is another commonly used point for measuring quality of UPW. It is located at the outlet of the submain or lateral take off valve used for UPW supply to the tool. Grab sample UPW analyses are either complementary to the on-line testing or alternative, depending on the availability of the instruments and the level of the UPW quality specifications. Grab sample analysis is typically performed for the following parameters: metals, anions, ammonium, silica (both dissolved and total), particles by SEM (scanning electron microscope), TOC (total organic compounds) and specific organic compounds. The anion analysis for seven most common inorganic anions (sulfate, chloride, fluoride, phosphate, nitrite, nitrate, and bromide) is performed by ion chromatography (IC), reaching single digit ppt detection limits. IC is also used to analyze ammonia and other metal cations. However ICPMS is the preferred method for metals due to lower detection limits and its ability to detect both dissolved and non-dissolved metals in UPW. IC is also used for the detection of urea in UPW down to the 0.5 ppb level. Urea is one of the more common contaminants in UPW and probably the most difficult for treatment. Silica analysis in UPW typically includes determination of reactive and total silica. Due to the complexity of silica chemistry, the form of silica measured is defined by the photometric (colorimetric) method as molybdate-reactive silica. Those forms of silica that are molybdate-reactive include dissolved simple silicates, monomeric silica and silicic acid, and an undetermined fraction of polymeric silica. Total silica determination in water employs high resolution ICPMS, GFAA (graphite furnace atomic absorption), and the photometric method combined with silica digestion. For many natural waters, a measurement of molybdate-reactive silica by this test method provides a close approximation of total silica, and, in practice, the colorimetric method is frequently substituted for other more time-consuming techniques. However, total silica analysis becomes more critical in UPW, where the presence of colloidal silica is expected due to silica polymerization in the ion exchange columns. Colloidal silica is considered more critical than dissolved in the electronic industry due to the bigger impact of nano-particles in water on the semiconductor manufacturing process. Sub-ppb (parts per billion) levels of silica make it equally complex for both reactive and total silica analysis, making the choice of total silica test often preferred. Although particles and TOC are usually measured using on-line methods, there is significant value in complementary or alternative off-line lab analysis. The value of the lab analysis has two aspects: cost and speciation. Smaller UPW facilities that cannot afford to purchase on-line instrumentation often choose off-line testing. TOC can be measured in the grab sample at a concentration as low as 5 ppb, using the same technique employed for the on-line analysis (see on-line method description). This detection level covers the majority of needs of less critical electronic and all pharmaceutical applications. When speciation of the organics is required for troubleshooting or design purposes, liquid chromatography-organic carbon detection (LC-OCD) provides an effective analysis. This method allows for identification of biopolymers, humics, low molecular weight acids and neutrals, and more, while characterizing nearly 100% of the organic composition in UPW with sub-ppb level of TOC. Similar to TOC, SEM particle analysis represents a lower cost alternative to the expensive online measurements and therefore it is commonly a method of choice in less critical applications. SEM analysis can provide particle counting for particle size down to 50 nm, which generally is in-line with the capability of online instruments. The test involves installation of the SEM capture filter cartridge on the UPW sampling port for sampling on the membrane disk with the pore size equal or smaller than the target size of the UPW particles. The filter is then transferred to the SEM microscope where its surface is scanned for detection and identification of the particles. The main disadvantage of SEM analysis is long sampling time. Depending on the pore size and the pressure in the UPW system, the sampling time can be between one week and one month. However, typical robustness and stability of the particle filtration systems allow for successful applications of the SEM method. Application of Energy Dispersive X-ray Spectroscopy (SEM-EDS) provides compositional analysis of the particles, making SEM also helpful for systems with on-line particle counters. Bacteria analysis is typically conducted following ASTM method F1094. The test method covers sampling and analysis of high purity water from water purification systems and water transmission systems by the direct sampling tap and filtration of the sample collected in the bag. These test methods cover both the sampling of water lines and the subsequent microbiological analysis of the sample by the culture technique. The microorganisms recovered from the water samples and counted on the filters include both aerobes and facultative anaerobes. The temperature of incubation is controlled at 28 ± 2 °C, and the period of incubation is 48 h or 72 h, if time permits. Longer incubation times are typically recommended for most critical applications. However 48 hrs is typically sufficient to detect water quality upsets. ==Transport==

Stainless steel remains a piping material of choice for the pharmaceutical industry. Due to its metallic contribution, most steel was removed from microelectronics UPW systems in the 1980s and replaced with high performance polymers of polyvinylidene fluoride (PVDF), perfluoroalkoxy (PFA), ethylene chlorotrifluoroethylene (ECTFE) and polytetrafluoroethylene (PTFE) in the US and Europe. In Asia, polyvinyl chloride (PVC), chlorinated polyvinyl chloride (CPVC) and polypropylene (PP) are popular, along with the high performance polymers. ==References==